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Fused Silica & Quartz

Ohara synthetic fused silica is produced by vapor-phase axial deposition and provides ultra-high purity, bubble free material.

Ohara also supplies natural quartz made from high-purity crystals. Both hydrous and anhydrous (low OH content) quartz with low bubbles and high heat resistance are available.

 

(Please click on the orange material link below for pdf datasheet and more specific information.)

Method Material Characteristics Application Standard Size

Fused Silica

SK-1300 Series

    SK-1300

    SK-1310

    SK-1320

• The VAD method developed for optical fiber has been further improved to manufacture fused silica.

• Unparalleled, ideal characteristics are achieved.

• Ultra-high purity (total metallic impurities less than 0.5ppm)
• The OH content can be controlled to 1 ppm or less.
• High heat resistance is ensured.
• High transmission is achieved. (The SK-1310 has excellent characteristics over the entire wavelength range of ultraviolet, visible, and infrared.)
• Contains no bubbles or striae.
• Excellent laser resistance properties

 

 

• Wafers for various types of devices such as TFT (poly-si thin-film transistor LCD), SOI (Silicon on Insulator) etc.

• Photomask substrates for ultra-LSI and LCD.

• Optical elements, lenses, mirrors and windows for ultraviolet and vacuum ultraviolet.

[Plates]
•50~ 500mm round
•50~ 1000mm square

Quartz

SK-4300 Series

   SK-4304

   SK-4306


• Well selected natural crystal is fused by oxyhydrogen flame to manufacture high quality quartz

• Various industrial jigs for semiconductors

• Large-scale cleaning tanks

• Sputtering targets

• Experimental apparatus

[Plates]
• Up to 700 mm square

fused-silica-01 fused-silica-01